On March 11 and 12, Professor Julian Schulze from the Plasma Technology Research Group in the Department of Electrical Engineering at Ruhr-University Bochum in Germany was invited to visit the Department of Electrical Engineering and Applied Electronics (EEA), Tsinghua University and gave an academic lecture titled “Knowledge Based Plasma Process Development in Technological Low Temperature Plasma”. More than 20 teachers and students, including Professor Zheng Bocong from the School of Physics at Beijing Institute of Technology, attended the lecture. The meeting was chaired by Fu Yangyang, Associate Director of the Institute of High Voltage and Insulation Technology at EEA.

Julian Schulze gave an academic lecture

During the lecture, Julian Schulze systematically introduced the simulated and experimental research work of the Plasma Technology Research Group at Ruhr-University Bochum in the field of low-temperature plasma technology, including the latest research progress in plasma electron kinetics, electron heating mechanisms, parameter control, and experimental measurement of plasma parameters. After the lecture, the attendees discussed topics such as plasma particle simulation models, parameter control methods, and experimental diagnostics with Julian Schulze, reaching a consensus on research topics, academic cooperation, and personnel exchange visits.

Academic Reports by Yao Jianxiong, Yang Dong, and Zhang Wenjin

Doctoral student Yao Jianxiong from Beijing Institute of Technology, and doctoral student Yang Dong and postdoctoral fellow Zhang Wenjin from EEA gave relevant academic reports on radio frequency-coupled plasma, and engaged in in-depth exchanges and discussions with Julian Schulze on topics such as the magnetic field’s effect on electron kinetics in plasma, radio frequency breakdown characteristics, and discharge similarity and scaling laws.

At the lecture

Julian Schulze obtained his Ph.D. in Plasma Physics from Ruhr-University Bochum in 2009, conducted postdoctoral research at the Wigner Research Centre for Physics of the Hungarian Academy of Sciences from 2010 to 2011, and served as an Assistant Professor of Plasma Physics at West Virginia University in the United States in 2013. Since 2016, he has been a professor in the Department of Electrical Engineering at Ruhr-University Bochum, and in 2022, he was appointed as a visiting professor in the Department of Physics at Dalian University of Technology. Julian Schulze and his team are dedicated to research on low-temperature plasma simulation and experimental diagnostics, including the kinetic properties of microscopic particles in plasma and the interaction mechanisms between plasma and material surfaces, providing theoretical guidance for optimizing plasma technology in semiconductor industry chip processing (such as etching and deposition). Julian Schulze has published over 200 important academic papers in renowned international journals, with an H-index of 45, making him an internationally renowned expert in the field of low-temperature plasma physics.

Group photo after the lecture